RAS PhysicsРадиотехника и электроника Journal of Communications Technology and Electronics

  • ISSN (Print) 0033-8494
  • ISSN (Online) 3034-5901

FEATURES OF THE CELLULAR MICROSTRUCTURES FORMATION IN IRON-GARNET FILMS USING FOCUSED ION BEAM ETCHING

PII
S3034590125070075-1
DOI
10.7868/S3034590125070075
Publication type
Article
Status
Published
Authors
Volume/ Edition
Volume 70 / Issue number 7
Pages
683-688
Abstract
The results of cellular microstructures formation in dielectric iron-garnet films are presented. We used local surface modification (etching) by focused ion beam lithography. It is shown that using a scanning electron microscope along with an ion column is effective to compensate for the surface charge while etching in iron garnets. This method does not require an additional sputtering of conductive layer onto the garnet film. The etching depth must be more than half of the initial film thickness for implementation of a monodomain state inside the cells, At the same time, the size of the initial domain structure in the film must be taken into account when choosing the lateral cell sizes.
Keywords
феррит-гранат магнитооптические материалы ячеистые микроструктуры доменная структура фокусированный ионный пучок диэлектрик поверхностный заряд
Date of publication
01.07.2025
Year of publication
2025
Number of purchasers
0
Views
43

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